In-situ annealing characterization of atomic-layer-deposited Al2O3 in N2, H2 and vacuum atmospheres
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: Thin Solid Films
سال: 2019
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2019.03.010